Mask inspection

Mask inspection

In microtechnology, mask inspection or photomask inspection is an operation of checking the correctness of the fabricated photomasks, used, e.g., for semiconductor device fabrication.[1]

Modern technologies for locating defects in photomasks are automated systems that involve scanning electron microscopy and other advanced tools.

Mask data inspection

The term "mask inspection" may also informally refer to mask data inspection step performed before actual writing the real mask. [2]

References

  1. ^ "VLSI technology: fundamentals and applications", by Yasuo Tarui, 1986, ISBN 3540125582, Chapter 4: "Mask Inspection Technology"
  2. ^ "Design for manufacturability and yield for nano-scale CMOS", by Charles Chiang, Jamil Kawa, 2007, ISBN 1402051875, p. 237

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