- Electron beam induced current
Electron beam induced current (EBIC) is a semiconductor analysis technique performed in a
scanning electron microscope (SEM) orscanning transmission electron microscope (STEM). It is used to identify buried junctions or defects in semiconductors, or to examineminority carrier properties. EBIC is similar tocathodoluminescence in that it depends on the creation ofelectron–hole pair s in the semiconductor sample by the microscope's electron beam. This technique is used in semiconductorfailure analysis andsolid-state physics .Physics of the Technique
If the semiconductor sample contains an internal
electric field , as will be present in thedepletion region at ap-n junction or schottky junction, the electron–hole pairs will be separated by drift due to the electric field. If the p- and n-sides (or semiconductor and schottky contact, in the case of a schottky device) are connected through a picoammeter, a current will flow.EBIC is best understood by analogy: in a
solar cell , photons of light fall on the entire cell, thus delivering energy and creating electron hole pairs, and cause a current to flow. In EBIC, energetic electrons take the role of the photons, causing the EBIC current to flow. However, because the electron beam of an SEM or STEM is very small, it is scanned across the sample and variations in the induced EBIC are used to map the electronic activity of the sample.By using the signal from the picoammeter as the imaging signal, an EBIC image is formed on the screen of the SEM or STEM. When a semiconductor device is imaged in cross-section, the depletion region will show bright EBIC contrast. The shape of the contrast can be treated mathematically to determine the minority carrier properties of the semiconductor, such as diffusion length and surface recombination velocity. In plan-view, areas with good crystal quality will show bright contrast, and areas containing defects will show dark EBIC contrast.
As such, EBIC is a semiconductor analysis technique useful for evaluating minority carrier properties and defect populations.
EBIC has also been extended to the study of local defects in insulators. For example, W.S. Lau (
Lau Wai Shing ) developed "true oxide electron beam induced current" in the 1990's. Thus, besidesp-n junction or Schottky junction, EBIC can also be applied toMOS diodes. Local defects insemiconductor and local defects in the insulator could be distinguished. There exists a kind of defect which originates in thesilicon substrate and extends into the insulator on top of thesilicon substrate. (Please see references below.)References
*H. J. Leamy, "Charge Collection scanning electron microscopy," "Journal of Applied Physics", V53(6), 1982, P. R51 (Review Article)
*C. Donolato, "On the analysis of diffusion length measurements by SEM," "Solid State Electronics", V25(11), 1982, P.1077
*J.-M. Bonard and J.-D. Ganiere, "Quantitative analysis of electron-beam-induced current profiles across p-n junctions in GaAs/Al0.4Ga0.6As heterostructures," "Journal of Applied Physics", V79(9), 1996, P.6987
*
*W. S. Lau, D. S. H. Chan, J. C. H. Phang, K. W. Chow, K. S. Pey, Y. P. Lim and B. Cronquist, "True oxide electron beam induced current for low-voltage imaging of local defects in very thin silicon dioxide films", Applied Physics Letters, vol. 63, no. 16 (18 October 1993), pp. 2240-2242.
*W. S. Lau, D. S. H. Chan, J. C. H. Phang, K. W. Chow, K. S. Pey, Y. P. Lim, V. Sane and B. Cronquist, "Quantitative imaging of local defects in very thin silicon dioxide films at low bias voltage by true oxide electron beam induced current", Journal of Applied Physics, vol. 77, no. 2 (15 Janurar 1995), pp. 739-746.
*W. S. Lau, V. Sane, K. S. Pey and B. Cronquist, "Two types of local oxide/substrate defects in very thin silicon dioxide films on silicon", Applied Physics Letters, vol. 67, no. 19 (6 November 1995), pp. 2854-2856.External links
EBIC Systems
* [http://ephemeron-labs.com/projects/] Ephemeron Labs EBIC System
* [http://www.gatan.com/files/PDF/products/Introduction_to_EBIC.pdf] Gatan EBIC Introduction
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