Resolution enhancement technologies

Resolution enhancement technologies

Resolution enhancement technologies are methods used to modify photomasks for integrated circuits (ICs) to compensate for limitations in the lithographic processes used to manufacture the chips.

Traditionally, after an IC design has been converted into a physical layout, the timing verified, and the polygons certified to be DRC-clean, the IC was ready for fabrication. The data files representing the various layers were shipped to a mask shop, which used mask-writing equipment to convert each data layer into a corresponding mask, and the masks were shipped to the fab where they were used to repeatedly manufacture the designs in silicon. In the past, the creation of the IC layout was the end of the involvement of electronic design automation.

However, as Moore’s law has driven features to ever-smaller dimensions, new physical effects that could be effectively ignored in the past are now having an impact on the features that are formed on the silicon wafer. So even though the final layout may represent what is desired in silicon, the layout can still undergo dramatic alteration through several EDA tools before the masks are fabricated and shipped.These alterations are required not to make any change in the device as designed, but to simply allow the manufacturing equipment, often purchased and optimized for making ICs one or two generations behind, to deliver the new devices. The intent of these alterations is to precompensate for known manufacturing distortions that are inherent in the manufacturing process. These distortions can arise in almost any processing step: photolithography, etching, planarization, and deposition, all of which introduce distortions of some kind. Fortunately, when these distortions are measured and quantified, an algorithm for their compensation can often be determined.

These lithographic compensations are usually grouped under the heading resolution enhancement techniques (RET). This is closely related to, and a part of, the more general category of design for manufacturability (IC) or DFM.

After RET, the next step in an EDA flow is usually mask data preparation.


*"Electronic Design Automation For Integrated Circuits Handbook", by Lavagno, Martin, and Scheffer, ISBN 0-8493-3096-3 A survey of the field, from which this summary was derived, with permission.

Wikimedia Foundation. 2010.

Игры ⚽ Поможем написать курсовую

Look at other dictionaries:

  • Nanolithography — Part of a series of articles on Nanoelectronics Single molecule electronics …   Wikipedia

  • Optical proximity correction — An illustration of optical proximity correction. The blue Γ like shape is what we d like printed on the wafer, in green is the shape after applying optical proximity correction, and the red contour is how the shape actually prints (quite close to …   Wikipedia

  • Mask data preparation — (MDP) is the step that translates an intended set of polygons on an integrated circuit layout into a form that can be physically written by the photomask writer. Usually this involves fracturing complex polygons into simpler shapes, often… …   Wikipedia

  • Computational lithography — (also known as computational scaling) is the set of mathematical and algorithmic approaches designed to improve the resolution attainable through photolithography. Computational lithography has come to the forefront of photolithography in 2008 as …   Wikipedia

  • Cellular neural network — Cellular neural networks (CNN) are a parallel computing paradigm similar to neural networks, with the difference that communication is allowed between neighbouring units only. Typical applications include image processing, analyzing 3D surfaces,… …   Wikipedia

  • Justice De Thézier — Infobox Person birth date = birth date|1975|4|20|mf=y birth place = Montreal, Quebec, Canada death date = death place = occupation = Social entrepreneur, creative professionalJustice De Thézier (born 20 April 1975) is a Canadian social… …   Wikipedia

  • Multiple patterning — is a class of technologies developed for photolithography to enhance the feature density. The simplest case of multiple patterning is double patterning, where a conventional lithography process is enhanced to produce double the expected number of …   Wikipedia

  • Immersion lithography — is a photolithography resolution enhancement technique that replaces the usual air gap between the final lens and the wafer surface with a liquid medium that has a refractive index greater than one. The resolution is increased by a factor equal… …   Wikipedia

  • HP LaserJet — LaserJet is the brand name used by the American computer company Hewlett Packard (HP) for their line of dry electrophotographic (DEP) laser printers. TechnologyHP LaserJets employ electro photographic laser marking engines sourced from the… …   Wikipedia

  • Next-generation lithography — (NGL) is a term used in integrated circuit manufacturing to describe the lithography technologies slated to replace photolithography. As of 2009 the most advanced form of photolithography is immersion lithography, in which water is used as an… …   Wikipedia

Share the article and excerpts

Direct link
Do a right-click on the link above
and select “Copy Link”