Hardmask

Hardmask: A hardmask is a material used in semiconductor processing as an etch mask in lieu of polymer or other organic "soft" materials. The idea is that polymers tend to be etched easily by oxygen, fluorine, chlorine or other reactive gases to the extent that a pattern defined using polymeric mask is rapidly degraded during plasma etching.

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Double patterning — is a class of technologies developed for photolithography to enhance the feature density. For the semiconductor industry, double patterning is the only lithography technique to be used for the 32 nm and 22 nm half pitch nodes in 2008 2009 and… … Wikipedia
Multiple patterning — is a class of technologies developed for photolithography to enhance the feature density. The simplest case of multiple patterning is double patterning, where a conventional lithography process is enhanced to produce double the expected number of … Wikipedia
16 nanometer — The 16 nanometer (16 nm) node is the technology node following the 22 nm node. The exact naming of the technology nodes comes from the International Technology Roadmap for Semiconductors (ITRS). By conservative ITRS estimates the 16 nm technology … Wikipedia

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