SU-8 photoresist

"For the heavy Soviet ground attack aircraft, see Sukhoi Su-8"

SU-8 Photoresist description

SU-8 is a commonly used negative photoresist. It is a very viscous polymer that can be spun or spread over a thickness ranging from 1 micrometer up to 2 millimeters and still be processed with standard mask aligner. It can be used to pattern high aspect ratio (>20) structures.Liu, J.; Cai, B.; Zhu, J.; Ding, G.; Zhao, X.; Yang, C.; Chen, D. " [http://dx.doi.org/10.1007/s00542-002-0242-2 Process research of high aspect ratio microstructure using SU-8 resist] " Microsystem Technologies 2004, V10, (4), 265.] Its maximum absorption is for ultraviolet light with a wavelength of 365 nm. When exposed, SU-8's long molecular chains cross-link causing the solidification of the material.

SU-8 is mainly used in for fabrication of microfluidics and MEMS parts. It is also one of the most bio-compatible materials and is often used in bio-MEMS.

Links for SU-8

[http://www.geocities.com/guerinlj/ THE SU8 HOMEPAGE]
[http://memscyclopedia.org/su8.html SU-8: Thick Photo-Resist for MEMS] A webpage with a lot of material data and process tricks.
Suppliers: [http://www.microchem.com Microchem ] , [http://www.gersteltec.ch Gersteltec]

References