Ion plating

Ion plating

Ion plating is a physical vapor deposition (PVD) process that is sometimes called "ion assisted deposition" (IAD) or "ion vapor deposition" (IVD) and is a version of "vacuum deposition". Ion plating utilizes concurrent or periodic bombardment of the substrate and depositing film by atomic-sized energetic particles. Bombardment prior to deposition is used to sputter clean the substrate surface. During deposition the bombardment is used to modify and control the properties of the depositing film. It is important that the bombardment be continuous between the cleaning and the deposition portions of the process to maintain an atomically clean interface.

In ion plating the energy, flux and mass of the bombarding species along with the ratio of bombarding particles to depositing particles are important processing variables. The depositing material may be vaporized either by evaporation, sputtering (bias sputtering), arc vaporization or by decomposition of a chemical vapor precursor chemical vapor deposition - CVD. The energetic particles used for bombardment are usually ions of an inert or reactive gas, or, in some cases, ions of the condensing film material (“film ions”). Ion plating can be done in a plasma environment where ions for bombardment are extracted from the plasma or it may be done in a vacuum environment where ions for bombardment are formed in a separate "ion gun". The latter ion plating configuration is often called Ion Beam Assisted Deposition (IBAD). By using a reactive gas or vapor in the plasma, films of compound materials can be deposited.

Ion plating is used to deposit hard coatings of compound materials on tools, adherent metal coatings, optical coatings with high densities, and conformal coatings on complex surfaces.

The ion plating process was first described in the technical literature by Donald M. Mattox of Sandia National Laboratories in 1964. ["Film Deposition Using Accelerated Ions" D.M. Mattox, Electrochemical Technology 2, 295, 1964 Coating Technology]

ee also

* List of coating techniques


Wikimedia Foundation. 2010.

Игры ⚽ Нужно сделать НИР?

Look at other dictionaries:

  • Ion plating — Ion plating. См. Ионная металлизация. (Источник: «Металлы и сплавы. Справочник.» Под редакцией Ю.П. Солнцева; НПО Профессионал , НПО Мир и семья ; Санкт Петербург, 2003 г.) …   Словарь металлургических терминов

  • ion plating — joninis dengimas statusas T sritis radioelektronika atitikmenys: angl. ion plating vok. Ionenplattierung, f rus. ионное покрытие, n pranc. revêtement ionique, m …   Radioelektronikos terminų žodynas

  • ion plating — joninė danga statusas T sritis radioelektronika atitikmenys: angl. ion plating vok. Ionenplattierung, f rus. ионное покрытие, n pranc. revêtement ionique, m …   Radioelektronikos terminų žodynas

  • Ионная металлизация — Ion plating Ионная металлизация. Общий термин, применяемый к процессу нанесения тонкого пленочного покрытия, при котором поверхность подложки и/или наносимое покрытие подвергается воздействию потока высокоэнергетических частиц (обычно газовых… …   Словарь металлургических терминов

  • Coating — is a covering that is applied to the surface of an object, usually referred to as the substrate. In many cases coatings are applied to improve surface properties of the substrate, such as appearance, adhesion, wetability, corrosion resistance,… …   Wikipedia

  • Vacuum deposition — Not to be confused with Vacuum coating. Vacuum deposition is a family of processes used to deposit layers atom by atom or molecule by molecule at sub atmospheric pressure (vacuum) on a solid surface. The layers may be as thin as one atom to… …   Wikipedia

  • Sputter cleaning — is the cleaning of a solid surface in a vacuum by using physical sputtering of the surface. Sputter cleaning is often used in vacuum deposition and ion plating. In 1955 Farnsworth, Schlier, George, and Burger reported using sputter cleaning in an …   Wikipedia

  • Recubrimiento — Para otros usos de este término, véase Recubrimiento (desambiguación). Recubrimiento (o por su designación en inglés: coating) es un material que es depositado sobre la superficie de un objeto, por lo general denominado sustrato. En muchos casos… …   Wikipedia Español

  • Chemical vapor deposition — DC plasma (violet) enhances the growth of carbon nanotubes in this laboratory scale PECVD apparatus. Chemical vapor deposition (CVD) is a chemical process used to produce high purity, high performance solid materials. The process is often used in …   Wikipedia

  • List of coating techniques — This list contains an overview of coating techniques for thin film deposition, found in the field of materials science. The techniques can be classified as follows: Chemical vapor deposition (CVD) * Metalorganic vapour phase epitaxy *… …   Wikipedia

Share the article and excerpts

Direct link
Do a right-click on the link above
and select “Copy Link”